Photomasque et procede pour acheminer des informations associees a un substrat de photomasque

Photomask and method for conveying information associated with a photomask substrate

Abstract

L'invention concerne un procédé destiné à transmettre des informations sur un substrat de photomasque. Le procédé consiste à réchauffer avec un laser une zone d'un substrat de photomasque située entre une surface supérieure et une surface inférieure du substrat de photomasque. La chaleur appliquée à la zone de substrat permet de former à l'intérieur du substrat une marque qui stocke les informations identifiant le substrat de photomasque.
A method for conveying information about a photomask (12) is disclosed. The method includes heating an area of a photomask substrate (16) located between a top surface and a bottom surface of the photomask substrate with a laser. The heat applied to the area of the substrate forms a mark (24) inside the substrate that stores information identifying the photomask substrate (16).

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Patent Citations (3)

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    Publication numberPublication dateAssigneeTitle